Development of highly electronegative plasma sources for negative ion etching, Plasma Etch and Strip in Microelectronics

Mihai Draghici, Eugen Stamate

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationProceedings
    Publication date2009
    Publication statusPublished - 2009
    Event2nd International workshop - Leuven (BE)
    Duration: 1 Jan 2009 → …


    Conference2nd International workshop
    CityLeuven (BE)
    Period01/01/2009 → …


    • Plasma processing
    • Fusion energy

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