Deposition and characterization of ITO films produced by laser ablation at 355 nm

E. Holmelund, Birgitte Thestrup Nielsen, Jørgen Schou, Niels Bent Larsen, Martin Meedom Nielsen, E. Johnson, S. Tougaard

Research output: Contribution to journalJournal articleResearchpeer-review


Indium tin oxide (ITO) films have been deposited by pulsed laser deposition (PLD) at 355 nm. Even though the absorption of laser light at the wavelength 355 nm is much smaller than that of the standard excimer lasers for PLD at 248 nm and 193 nm, high-quality films can be produced. At high fluence and at high substrate temperatures, the specific resistivity of the films, 2–3×10-4 Ω cm, is comparable to values obtained with excimer lasers, whereas the resistivities obtained at room temperature are somewhat higher than those of films produced by excimer lasers. The transmission coefficient of visible light, about 0.9, is also comparable to values for films deposited by excimer lasers. The crystalline structure of films produced at 355 nm is similar to that of samples produced by these lasers.
Original languageEnglish
JournalApplied Physics A: Materials Science & Processing
Issue number2
Pages (from-to)147-152
Publication statusPublished - 2002

Fingerprint Dive into the research topics of 'Deposition and characterization of ITO films produced by laser ablation at 355 nm'. Together they form a unique fingerprint.

Cite this