Deep-UV-Lithography: Principles, Optimization, and Simulation

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    Original languageEnglish
    Title of host publicationBook of Abstracts. DTU's Sustain Conference 2015
    Number of pages1
    Place of PublicationLyngby
    PublisherTechnical University of Denmark
    Publication date2015
    Article numberP-9
    Publication statusPublished - 2015
    EventDTU Sustain Conference 2015 - DTU, Lyngby, Denmark
    Duration: 17 Dec 201517 Dec 2015
    http://www.sustain.dtu.dk/About/Conference-2015

    Conference

    ConferenceDTU Sustain Conference 2015
    LocationDTU
    CountryDenmark
    CityLyngby
    Period17/12/201517/12/2015
    Internet address

    Bibliographical note

    Poster presentation

    Cite this

    Keil, M., Møller, N. P., Khomtchenko, E., & Johansen, L. S. (2015). Deep-UV-Lithography: Principles, Optimization, and Simulation. In Book of Abstracts. DTU's Sustain Conference 2015 [P-9] Technical University of Denmark.