Deep Reactive Ion Etching for High Aspect Ratio Microelectromechanical Components

Søren Jensen, Arda Deniz Yalcinkaya, S. Jacobsen, T. Rasmussen, Frank Engel Rasmussen, Ole Hansen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	Nordic Semiconductor Meeting Paper 1040
Place of Publication	Tampere, Finland
Publication date	2003
Publication status	Published - 2003

Cite this

Jensen, S., Yalcinkaya, A. D., Jacobsen, S., Rasmussen, T., Rasmussen, F. E., & Hansen, O. (2003). Deep Reactive Ion Etching for High Aspect Ratio Microelectromechanical Components. In Nordic Semiconductor Meeting Paper 1040

@inproceedings{4f383dfd792f46a4b89df8a844067314,

title = "Deep Reactive Ion Etching for High Aspect Ratio Microelectromechanical Components",

author = "S{\o}ren Jensen and Yalcinkaya, {Arda Deniz} and S. Jacobsen and T. Rasmussen and Rasmussen, {Frank Engel} and Ole Hansen",

year = "2003",

language = "English",

booktitle = "Nordic Semiconductor Meeting Paper 1040",

}

Nordic Semiconductor Meeting Paper 1040. Tampere, Finland, 2003.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review