Deep Reactive Ion Etching for High Aspect Ratio Microelectromechanical Components

Søren Jensen, Arda Deniz Yalcinkaya, S. Jacobsen, T. Rasmussen, Frank Engel Rasmussen, Ole Hansen

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationNordic Semiconductor Meeting Paper 1040
    Place of PublicationTampere, Finland
    Publication date2003
    Publication statusPublished - 2003

    Cite this

    Jensen, S., Yalcinkaya, A. D., Jacobsen, S., Rasmussen, T., Rasmussen, F. E., & Hansen, O. (2003). Deep Reactive Ion Etching for High Aspect Ratio Microelectromechanical Components. In Nordic Semiconductor Meeting Paper 1040