Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles

Radu Malureanu; Maksim Zalkovskij; Andrei Andryieuski; Andrei Lavrinenko

doi:10.1149/1.3502640

Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles

Radu Malureanu, Maksim Zalkovskij, Andrei Andryieuski, Andrei Lavrinenko

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Abstract

In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional 3D structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications.

Original language	English
Journal	Journal of The Electrochemical Society
Volume	157
Issue number	12
Pages (from-to)	K284-K288
ISSN	0013-4651
DOIs	https://doi.org/10.1149/1.3502640
Publication status	Published - 2010

Keywords

nanostructured materials
nanofabrication
electroless deposition
surface roughness
silver
atomic force microscopy
metallic thin films
scanning electron microscopy
electroless deposited coatings

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title = "Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles",

abstract = "In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional 3D structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications.",

keywords = "nanostructured materials, nanofabrication, electroless deposition, surface roughness, silver, atomic force microscopy, metallic thin films, scanning electron microscopy, electroless deposited coatings",

author = "Radu Malureanu and Maksim Zalkovskij and Andrei Andryieuski and Andrei Lavrinenko",

year = "2010",

doi = "10.1149/1.3502640",

language = "English",

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TY - JOUR

T1 - Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles

AU - Malureanu, Radu

AU - Zalkovskij, Maksim

AU - Andryieuski, Andrei

AU - Lavrinenko, Andrei

PY - 2010

Y1 - 2010

N2 - In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional 3D structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications.

AB - In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional 3D structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications.

KW - nanostructured materials

KW - nanofabrication

KW - electroless deposition

KW - surface roughness

KW - silver

KW - atomic force microscopy

KW - metallic thin films

KW - scanning electron microscopy

KW - electroless deposited coatings

U2 - 10.1149/1.3502640

DO - 10.1149/1.3502640

M3 - Journal article

SN - 0013-4651

VL - 157

SP - K284-K288

JO - Journal of The Electrochemical Society

JF - Journal of The Electrochemical Society

IS - 12

ER -

Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles

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