Controlled Ag electroless deposition in bulk structures with complex three-dimensional profiles

Radu Malureanu, Maksim Zalkovskij, Andrei Andryieuski, Andrei Lavrinenko

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

In this work we show the possibility of controlled deposition of a nanometer-sized silver layer on three-dimensional 3D structures. The deposition takes place in liquid environment, allowing for an easy and fast processing with intrinsically isotropic characteristics. The obtained layers are of high uniformity, having an average roughness of about 4 nm. The characterization of the metal deposition is done using both the scanning electron microscopy technique as well as by atomic force microscope measurements. The electroless technique can be easily implemented, providing the effective and reliable metal deposition for fabrication of 3D samples in the broad range of plasmonics and photonics applications.
Original languageEnglish
JournalJournal of The Electrochemical Society
Volume157
Issue number12
Pages (from-to)K284-K288
ISSN0013-4651
DOIs
Publication statusPublished - 2010

Keywords

  • nanostructured materials
  • nanofabrication
  • electroless deposition
  • surface roughness
  • silver
  • atomic force microscopy
  • metallic thin films
  • scanning electron microscopy
  • electroless deposited coatings

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