Control of ion flux non-uniformity on wafer caused by sheath lens effect

Eugen Stamate, N. Holtzer, H. Sugai

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	Proceedings of 26th International Symposium on Dry Process (DPS)
Number of pages	5
Publication date	2004
Pages	117-121
Publication status	Published - 2004
Externally published	Yes
Event	26th International Symposium on Dry Process - Tokyo, Japan Duration: 1 Jan 2004 → … Conference number: 26 https://www.plasma.engg.nagoya-u.ac.jp/DPS/dps2004.html

Conference	26th International Symposium on Dry Process
Number	26
Country/Territory	Japan
City	Tokyo
Period	01/01/2004 → …
Internet address	https://www.plasma.engg.nagoya-u.ac.jp/DPS/dps2004.html

OpenUrl availability

@inproceedings{ca1bd46886494ec6bb8abde5cd47025d,

title = "Control of ion flux non-uniformity on wafer caused by sheath lens effect",

author = "Eugen Stamate and N. Holtzer and H. Sugai",

year = "2004",

language = "English",

pages = "117--121",

booktitle = "Proceedings of 26th International Symposium on Dry Process (DPS)",

note = "26th International Symposium on Dry Process, DPS 2004 ; Conference date: 01-01-2004",

url = "https://www.plasma.engg.nagoya-u.ac.jp/DPS/dps2004.html",

}

TY - GEN

T1 - Control of ion flux non-uniformity on wafer caused by sheath lens effect

AU - Stamate, Eugen

AU - Holtzer, N.

AU - Sugai, H.

N1 - Conference code: 26

PY - 2004

Y1 - 2004

M3 - Article in proceedings

SP - 117

EP - 121

BT - Proceedings of 26th International Symposium on Dry Process (DPS)

T2 - 26th International Symposium on Dry Process

Y2 - 1 January 2004

ER -