Control of ion flux non-uniformity on wafer caused by sheath lens effect

Eugen Stamate, N. Holtzer, H. Sugai

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Original languageEnglish
Title of host publicationProceedings of 26th International Symposium on Dry Process (DPS)
Number of pages5
Publication date2004
Pages117-121
Publication statusPublished - 2004
Externally publishedYes
Event26th International Symposium on Dry Process (DPS) - Tokyo, Japan
Duration: 1 Jan 2004 → …

Conference

Conference26th International Symposium on Dry Process (DPS)
CountryJapan
CityTokyo
Period01/01/2004 → …

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