Comparison between different dispersion engineering methods in slow light photonic crystal waveguides

Fengwen Wang, Jakob Søndergaard Jensen, Ole Sigmund

    Research output: Contribution to journalConference articleResearchpeer-review

    Abstract

    This paper compares the performance of different dispersion engineering methods in slow light photonic crystal waveguides, i.e., geometrical parameter optimization and topology optimization. In both methods, the design robustness is enforced by considering the dilated, intermediate and eroded designs corresponding to the under-, standard- and over-etching processes in the manufacturing process. For vg* = c/50, the parameter optimized design achieves a normalized group index bandwidth product of 0.33 and the topology optimized design achieves 0.53. The numerical results illustrate that waveguides with optimized hole sizes and positions can be efficient for dispersion engineering but that large improvements are possible if irregular geometries are allowed using topology optimization.
    Original languageEnglish
    JournalAIP Conference Proceedings
    Volume1398
    Pages (from-to)180-182
    ISSN0094-243X
    DOIs
    Publication statusPublished - 2011
    Event4th International Workshop on Theoretical and Computational Nanophotonics - Bad Honnef, Germany
    Duration: 26 Oct 201128 Oct 2011
    Conference number: 4

    Conference

    Conference4th International Workshop on Theoretical and Computational Nanophotonics
    Number4
    Country/TerritoryGermany
    CityBad Honnef
    Period26/10/201128/10/2011

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