Combined nanoimprint and photolithography of integrated polymer optics

Mads Brøkner Christiansen; Mikkel Schøler; Morten Gersborg-Hansen; Anders Kristensen

doi:10.1109/LEOSST.2007.4288352

Combined nanoimprint and photolithography of integrated polymer optics

Mads Brøkner Christiansen, Mikkel Schøler, Morten Gersborg-Hansen, Anders Kristensen

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research › peer-review

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Abstract

We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.

Original language	English
Title of host publication	Digest of the IEEE LEOS Summer Topical Meetings, 2007
Publisher	IEEE
Publication date	2007
Pages	101-102
Article number	4288352
ISBN (Print)	1-4244-0926-8
DOIs	https://doi.org/10.1109/LEOSST.2007.4288352
Publication status	Published - 2007
Event	Digest of the IEEE LEOS Summer Topical Meetings - Portland, United States Duration: 23 Jul 2007 → 25 Jul 2007

Conference

Conference	Digest of the IEEE LEOS Summer Topical Meetings
Country/Territory	United States
City	Portland
Period	23/07/2007 → 25/07/2007

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Copyright: 2007 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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title = "Combined nanoimprint and photolithography of integrated polymer optics",

abstract = "We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.",

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AU - Schøler, Mikkel

AU - Gersborg-Hansen, Morten

AU - Kristensen, Anders

N1 - Copyright: 2007 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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N2 - We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.

AB - We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.

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BT - Digest of the IEEE LEOS Summer Topical Meetings, 2007

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T2 - Digest of the IEEE LEOS Summer Topical Meetings

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ER -

Combined nanoimprint and photolithography of integrated polymer optics

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