Combined nanoimprint and photolithography of integrated polymer optics

Mads Brøkner Christiansen, Mikkel Schøler, Morten Gersborg-Hansen, Anders Kristensen

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    Abstract

    We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.
    Original languageEnglish
    Title of host publicationDigest of the IEEE LEOS Summer Topical Meetings, 2007
    PublisherIEEE
    Publication date2007
    Pages101-102
    Article number4288352
    ISBN (Print)1-4244-0926-8
    DOIs
    Publication statusPublished - 2007
    EventDigest of the IEEE LEOS Summer Topical Meetings - Portland, United States
    Duration: 23 Jul 200725 Jul 2007

    Conference

    ConferenceDigest of the IEEE LEOS Summer Topical Meetings
    CountryUnited States
    CityPortland
    Period23/07/200725/07/2007

    Bibliographical note

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