Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

Abadal Gabriel Berini, Anja Boisen, Zachary James Davis, Ole Hansen, Francois Grey

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    Abstract

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromechanical systems (NEMS) by reactive ion etching. In particular, the laser-modified areas can be subsequently locally oxidized by AFM and the oxidized regions can be selectively removed by chemical etching. This provides a straightforward means to define the overall conducting structure of a device by laser writing, and to perform submicron modifications by AFM oxidation. The mask fabrication for a nanoscale suspended resonator bridge is used to illustrate the advantages of this combined technique for NEMS. (C) 1999 American Institute of Physics. [S0003-6951(99)00221-1].
    Original languageEnglish
    JournalApplied Physics Letters
    Volume74
    Issue number21
    Pages (from-to)3206-3208
    ISSN0003-6951
    DOIs
    Publication statusPublished - 1999

    Bibliographical note

    Copyright (1999) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

    Keywords

    • AFM
    • NANOSTRUCTURES

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