Combined electron beam and UV lithography in SU-8

Research output: Contribution to journalJournal article – Annual report year: 2007Researchpeer-review

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We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features in a single polymer film on the wafer scale. The height of the micrometer and nanometer scale features is matched within 30 nm. As a pattern transfer application, we demonstrate stamp fabrication and thermal nanoimprint of a 2-dimensional array of 100 nm wide lines with a pitch of 380 nm in connection with micrometer scale features.
Original languageEnglish
JournalMicroelectronic Engineering
Volume84
Pages (from-to)1058-1061
ISSN0167-9317
DOIs
Publication statusPublished - 2007
CitationsWeb of Science® Times Cited: No match on DOI

    Research areas

  • Electron beam lithography, Combined lithography, SU-8, Nanolithography

ID: 3030662