Abstract
When depositing amorphous SrTiO3 (STO) films on crystalline STO substrates by pulsed laser deposition, metallic interfaces are observed, though both materials are band-gap insulators. The interfacial conductivity exhibits strong dependence on oxygen pressure during film growth, which is closely related to the STO plasma expansion in the background gas of oxygen. By controlling the charge balance in the STO plasma with an external bias, V-bias, of -10 V
Original language | English |
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Journal | Applied Physics Letters |
Volume | 98 |
Issue number | 23 |
Pages (from-to) | 232105 (3 pages) |
ISSN | 0003-6951 |
DOIs | |
Publication status | Published - 2011 |
Keywords
- Plasma processing