Characterization of Silicon Rich Oxides with Tunable Optical Band Gap on Sapphire Substrates by Photoluminescence, UV/Vis and Raman Spectroscopy

Wolff-Ragnar Kiebach, Jose Alberto Luna-Lopez, Guilherme Osvaldo Dias, Mariano Aceves-Mijares, Jacobus Willibrordus Swart

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

A detailed analysis of the optical properties of silicon rich oxides (SRO) thin films and the factors that influence them is presented. SRO films with different Si content were synthesized via LPCVD (low pressure chemical vapor deposition) on sapphire substrates. Photoluminescence (PL), UV/Vis and Raman spectroscopy were used to characterize the samples. An intense emission in blue region was found. An interesting fact is that the optical band gap correlates linearly with the reactants ratio, which allows the tuning of the band gap. The influence of parameters such as substrate, Si content, annealing temperature and annealing time on the optical properties are discussed and the possible mechanisms of the photoluminescence are compared with our experimental data.
Original languageEnglish
JournalJournal of the Mexican Chemical Society
Volume52
Issue number3
Pages (from-to)212-218
ISSN1870-249X
Publication statusPublished - 2008
Externally publishedYes

Fingerprint

Dive into the research topics of 'Characterization of Silicon Rich Oxides with Tunable Optical Band Gap on Sapphire Substrates by Photoluminescence, UV/Vis and Raman Spectroscopy'. Together they form a unique fingerprint.

Cite this