Channel waveguides formed by ion implantation of 20 % Ge doped silica

P. Leech, M. Faith, M. C. Ridgway, Otto Leistiko

    Research output: Contribution to journalJournal articleResearchpeer-review

    Original languageEnglish
    JournalElectronics Letters
    Volume32
    Pages (from-to)1000-1002
    ISSN0013-5194
    Publication statusPublished - 1996

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