Challenges of sample preparation for cross sectional EBSD analysis of electrodeposited nickel films

Hossein Alimadadi (Invited author), Karen Pantleon (Invited author)

    Research output: Contribution to journalConference articleResearchpeer-review

    Abstract

    Thorough microstructure and crystallographic orientation analysis of thin films by means of electron backscatter diffraction requires cross section preparation of the film-substrate compound. During careful preparation, changes of the rather non-stable as-deposited microstructure must be avoided. Different procedures for sample preparation including mechanical grinding and polishing, electropolishing and focused ion beam milling have been applied to a nickel film electrodeposited on top of an amorphous Ni-P layer on a Cu-substrate. Reliable EBSD analysis of the whole cross section can be obtained by mechanical polishing with colloidal silica followed by either short electropolishing or gentle milling with low current of the focused ion beam.
    Original languageEnglish
    JournalProceedings of the Risø International Symposium on Materials Science
    Volume30
    Pages (from-to)183-189
    ISSN0907-0079
    Publication statusPublished - 2009
    Event30th Risø International Symposium on Materials Science : Nanostructured metals – Fundamentals to applications - Risø DTU, Roskilde, Denmark
    Duration: 7 Sep 200911 Sep 2009

    Conference

    Conference30th Risø International Symposium on Materials Science : Nanostructured metals – Fundamentals to applications
    LocationRisø DTU
    Country/TerritoryDenmark
    CityRoskilde
    Period07/09/200911/09/2009

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