Broadband antireflective silicon carbide surface produced by cost-effective method

Aikaterini Argyraki, Yiyu Ou, Haiyan Ou

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A cost-effective method for fabricating antireflective subwavelength structures on silicon carbide is demonstrated. The nanopatterning is performed in a 2-step process: aluminum deposition and
reactive ion etching. The effect, of the deposited aluminum film thickness and the reactive ion etching conditions, on the average surface reflectance and nanostructure landscape have been investigated systematically. The average reflectance of silicon carbide surface is significantly suppressed from 25.4% to 0.05%, under the optimal experimental conditions, in the wavelength range of 390-784 nm. The presence of stochastic nanostructures also changes the wetting properties of silicon carbide surface from hydrophilic (47°) to hydrophobic (108°).
Original languageEnglish
JournalOptical Materials Express
Issue number8
Pages (from-to)1119-1126
Number of pages8
Publication statusPublished - 2013


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