Abstract
Nanodome structures are demonstrated on the SiC substrate by using nanosphere lithography and dry etching. Significant surface antireflection has been observed over a broad spectral range from 400 nm to 1600 nm.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the 10th International Conference on Group IV Photonics |
| Publisher | IEEE |
| Publication date | 2013 |
| Pages | 39-40 |
| ISBN (Print) | 978-1-4673-5804-0 |
| Publication status | Published - 2013 |
| Event | 2013 10th IEEE International Conference on Group IV Photonics - Seoul, Korea, Republic of Duration: 28 Aug 2013 → 30 Aug 2013 Conference number: 10 https://ieeexplore.ieee.org/xpl/conhome/6621626/proceeding |
Conference
| Conference | 2013 10th IEEE International Conference on Group IV Photonics |
|---|---|
| Number | 10 |
| Country/Territory | Korea, Republic of |
| City | Seoul |
| Period | 28/08/2013 → 30/08/2013 |
| Internet address |
Keywords
- Nanofabrication
- Sub-wavelength material
- Surface antireflection
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