Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV wavelength

Rui Min, Beatriz Ortega, Luis Pereira, Tiago Paixão, Paulo André, Getinet Woyessa, Ole Bang, Dongzhou Zhong, Paulo Antunes, João L. Pinto, Carlos Marques

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

    67 Downloads (Pure)

    Abstract

    We present the first results about Bragg grating devices in undoped PMMA POF fabricated with relative low cost Nd:YAG laser (when compared with excimer lasers) at 266 nm wavelength at low transmission loss in 850 nm region. Then temperature, humidity and strain characterizations are supplied for potential applications
    Original languageEnglish
    Title of host publicationProceedings of 2019 International Microwave and Optoelectronics Conference
    Number of pages3
    PublisherIEEE
    Publication date2019
    ISBN (Print)9781728131009, 978-1-7281-3099-6
    DOIs
    Publication statusPublished - 2019
    Event2019 International Microwave and Optoelectronics Conference - Centro Cultural e de Congressos, Aveiro , Portugal
    Duration: 10 Nov 201914 Nov 2019

    Conference

    Conference2019 International Microwave and Optoelectronics Conference
    LocationCentro Cultural e de Congressos
    Country/TerritoryPortugal
    CityAveiro
    Period10/11/201914/11/2019

    Keywords

    • Bragg grating
    • Polymer optical fiber
    • UV irradiation

    Fingerprint

    Dive into the research topics of 'Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV wavelength'. Together they form a unique fingerprint.

    Cite this