Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV wavelength

Rui Min, Beatriz Ortega, Luis Pereira, Tiago Paixão, Paulo André, Getinet Woyessa, Ole Bang, Dongzhou Zhong, Paulo Antunes, João L. Pinto, Carlos Marques

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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Abstract

We present the first results about Bragg grating devices in undoped PMMA POF fabricated with relative low cost Nd:YAG laser (when compared with excimer lasers) at 266 nm wavelength at low transmission loss in 850 nm region. Then temperature, humidity and strain characterizations are supplied for potential applications
Original languageEnglish
Title of host publicationProceedings of 2019 International Microwave and Optoelectronics Conference
Number of pages3
Publication date2019
Publication statusPublished - 2019
Event2019 International Microwave and Optoelectronics Conference - Centro Cultural e de Congressos, Aveiro , Portugal
Duration: 10 Nov 201914 Nov 2019

Conference

Conference2019 International Microwave and Optoelectronics Conference
LocationCentro Cultural e de Congressos
CountryPortugal
CityAveiro
Period10/11/201914/11/2019

Keywords

  • Bragg grating
  • Polymer optical fiber
  • UV irradiation

Cite this

Min, R., Ortega, B., Pereira, L., Paixão, T., André, P., Woyessa, G., Bang, O., Zhong, D., Antunes, P., Pinto, J. L., & Marques, C. (2019). Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV wavelength. In Proceedings of 2019 International Microwave and Optoelectronics Conference