Block copolymer self-assembly based device structures

Sozaraj Rasappa, Michael A. Morris (Supervisor), Justin D. Holmes (Supervisor)

Research output: Book/ReportPh.D. thesisResearch

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Abstract

This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were
used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.
Original languageEnglish
Number of pages160
Publication statusPublished - 2013
Externally publishedYes

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