Abstract
Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.
© 2012 Elsevier B.V. All rights reserved.
© 2012 Elsevier B.V. All rights reserved.
Original language | English |
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Journal | Thin Solid Films |
Volume | 522 |
Pages (from-to) | 318–323 |
ISSN | 0040-6090 |
DOIs | |
Publication status | Published - 2012 |
Externally published | Yes |
Event | EMRS 2011 Symposium Q - Nice, France Duration: 9 May 2011 → 13 May 2011 |
Conference
Conference | EMRS 2011 Symposium Q |
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Country/Territory | France |
City | Nice |
Period | 09/05/2011 → 13/05/2011 |