Block copolymer lithography: Feature size control and extension by an over-etch technique

Sozaraj Rasappa, Dipu Borah, Ramsankar Senthamaraikannan, Colm C. Faulkner, Matthew T. Shaw, Peter Gleeson, Justin D. Holmes, Michael A. Morris

Research output: Contribution to journalConference articleResearchpeer-review

Abstract

Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.
© 2012 Elsevier B.V. All rights reserved.
Original languageEnglish
JournalThin Solid Films
Volume522
Pages (from-to)318–323
ISSN0040-6090
DOIs
Publication statusPublished - 2012
Externally publishedYes
EventEMRS 2011 Symposium Q - Nice, France
Duration: 9 May 201113 May 2011

Conference

ConferenceEMRS 2011 Symposium Q
CountryFrance
CityNice
Period09/05/201113/05/2011

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