Batch fabrication of nanotubes suspended between microelectrodes

Ramona Valentina Mateiu, T. Stöckli, H. F. Knapp, Y. Keles, Peter Bøggild, Anja Boisen

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    We report a fabrication method, which uses standard UV-lithography to pattern the catalyst for the chemical vapour deposition(CVD) of suspended double clamped single walled carbon nanotubes. By using an aqueous solution of Fe(NO3)3 the patterning of the catalyst material onto microelectrodes can be done with a simple lift-off process with standard photolithographic resist. An applied electric field is sustained between the microelectrodes during CVD to guide the nanotube growth. Comparison with simulations shows that the location and the orientation of the grown carbon nanotubes (CNT) correspond to the regions of maximum electric field, enabling accurate positioning of a nanotube by controlling the shape of the microelectrodes. The CNT bridges are deflected tens of nm when a DC voltage is applied between the nanotube and a gate microelectrode indicating that the clamping through the catalyst particles is not only mechanically stable but also electrical conducting. This method could be used to fabricate nanoelectromechanical systems based on suspended double clamped CNTs depending only on photolithography and standard Cleanroom processes.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Issue number5-8
    Pages (from-to)1431-1435
    Publication statusPublished - 2007
    Event32nd International Conference on Micro- and Nano- Engineering 2006 - La Caixa, Barcelona, Spain
    Duration: 17 Sep 200620 Sep 2006
    Conference number: 32


    Conference32nd International Conference on Micro- and Nano- Engineering 2006
    LocationLa Caixa
    SponsorLa Caixa
    Internet address


    • Single-walled CNTs
    • Nanotube based NEMS
    • Nanotube bridges


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