Abstract
We report a fabrication method, which uses standard UV-lithography to pattern the catalyst for the chemical vapour deposition(CVD) of suspended double clamped single walled carbon nanotubes. By using an aqueous solution of Fe(NO3)3 the patterning of the catalyst material onto microelectrodes can be done with a simple lift-off process with standard photolithographic resist. An applied
electric field is sustained between the microelectrodes during CVD to guide the nanotube growth. Comparison with simulations shows that the location and the orientation of the grown carbon nanotubes (CNT) correspond to the regions of maximum electric field, enabling accurate positioning of a nanotube by controlling the shape of the microelectrodes. The CNT bridges are deflected tens of
nm when a DC voltage is applied between the nanotube and a gate microelectrode indicating that the clamping through the catalyst particles is not only mechanically stable but also electrical conducting. This method could be used to fabricate nanoelectromechanical systems based on suspended double clamped CNTs depending only on photolithography and standard Cleanroom processes.
Original language | English |
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Journal | Microelectronic Engineering |
Volume | 84 |
Issue number | 5-8 |
Pages (from-to) | 1431-1435 |
ISSN | 0167-9317 |
DOIs | |
Publication status | Published - 2007 |
Event | 32nd International Conference on Micro- and Nano- Engineering 2006 - La Caixa, Barcelona, Spain Duration: 17 Sept 2006 → 20 Sept 2006 Conference number: 32 http://www.mne-conf.org/2006/exhibition.php |
Conference
Conference | 32nd International Conference on Micro- and Nano- Engineering 2006 |
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Number | 32 |
Location | La Caixa |
Country/Territory | Spain |
City | Barcelona |
Period | 17/09/2006 → 20/09/2006 |
Sponsor | La Caixa |
Internet address |
Keywords
- Single-walled CNTs
- Nanotube based NEMS
- Nanotube bridges