Batch fabrication of nanopatterned graphene devices via nanoimprint lithography

David Mackenzie, Kristian Smistrup, Patrick Rebsdorf Whelan, Birong Luo, Abhay Shivayogimath, Theodor Nielsen, Dirch Hjorth Petersen, Sara A. Messina, Peter Bøggild

Research output: Contribution to journalJournal articleResearchpeer-review

331 Downloads (Pure)

Abstract

Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modest
decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.
Original languageEnglish
Article number193103
JournalApplied Physics Letters
Volume111
Number of pages5
ISSN0003-6951
DOIs
Publication statusPublished - 2017

Cite this