Batch fabrication of nanopatterned graphene devices via nanoimprint lithography

David Mackenzie, Kristian Smistrup, Patrick Rebsdorf Whelan, Birong Luo, Abhay Shivayogimath, Theodor Nielsen, Dirch Hjorth Petersen, Sara A. Messina, Peter Bøggild

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modest
decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.
Original languageEnglish
Article number193103
JournalApplied Physics Letters
Volume111
Number of pages5
ISSN0003-6951
DOIs
Publication statusPublished - 2017

Cite this

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title = "Batch fabrication of nanopatterned graphene devices via nanoimprint lithography",
abstract = "Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modestdecrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.",
author = "David Mackenzie and Kristian Smistrup and Whelan, {Patrick Rebsdorf} and Birong Luo and Abhay Shivayogimath and Theodor Nielsen and Petersen, {Dirch Hjorth} and Messina, {Sara A.} and Peter B{\o}ggild",
year = "2017",
doi = "10.1063/1.5010923",
language = "English",
volume = "111",
journal = "Applied Physics Letters",
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publisher = "American Institute of Physics",

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Batch fabrication of nanopatterned graphene devices via nanoimprint lithography. / Mackenzie, David; Smistrup, Kristian ; Whelan, Patrick Rebsdorf; Luo, Birong; Shivayogimath, Abhay; Nielsen, Theodor; Petersen, Dirch Hjorth; Messina, Sara A.; Bøggild, Peter.

In: Applied Physics Letters, Vol. 111, 193103, 2017.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Batch fabrication of nanopatterned graphene devices via nanoimprint lithography

AU - Mackenzie, David

AU - Smistrup, Kristian

AU - Whelan, Patrick Rebsdorf

AU - Luo, Birong

AU - Shivayogimath, Abhay

AU - Nielsen, Theodor

AU - Petersen, Dirch Hjorth

AU - Messina, Sara A.

AU - Bøggild, Peter

PY - 2017

Y1 - 2017

N2 - Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modestdecrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.

AB - Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modestdecrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.

U2 - 10.1063/1.5010923

DO - 10.1063/1.5010923

M3 - Journal article

VL - 111

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

M1 - 193103

ER -