Batch fabrication of nanopatterned graphene devices via nanoimprint lithography

David Mackenzie, Kristian Smistrup, Patrick Rebsdorf Whelan, Birong Luo, Abhay Shivayogimath, Theodor Nielsen, Dirch Hjorth Petersen, Sara A. Messina, Peter Bøggild

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Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25mm2 devices. The nanopatterning process introduces a modest
decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned.
Original languageEnglish
Article number193103
JournalApplied Physics Letters
Number of pages5
Publication statusPublished - 2017


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