Abstract
An effective design principle has been applied to photonic crystal
waveguide bends fabricated in silicon-on-insulator material using deep
UV lithography resulting in a large increase in the low-loss bandwidth
of the bends. Furthermore, it is experimentally demonstrated that the
absolute bandwidth range can be adjusted in a post-fabrication thermal
oxidation process.
| Original language | English |
|---|---|
| Journal | Electronics Letters |
| Volume | 40 |
| Issue number | 20 |
| Pages (from-to) | 1263-1264 |
| ISSN | 0013-5194 |
| Publication status | Published - 2004 |