Abstract
An effective design principle has been applied to photonic crystal
waveguide bends fabricated in silicon-on-insulator material using deep
UV lithography resulting in a large increase in the low-loss bandwidth
of the bends. Furthermore, it is experimentally demonstrated that the
absolute bandwidth range can be adjusted in a post-fabrication thermal
oxidation process.
Original language | English |
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Journal | Electronics Letters |
Volume | 40 |
Issue number | 20 |
Pages (from-to) | 1263-1264 |
ISSN | 0013-5194 |
Publication status | Published - 2004 |