Automated Micro Hall Effect measurements

Dirch Hjorth Petersen; Henrik Hartmann Henrichsen; Rong Lin; Peter F. Nielsen; Ole Hansen

doi:10.1109/ISTDM.2014.6874677

Automated Micro Hall Effect measurements

Dirch Hjorth Petersen, Henrik Hartmann Henrichsen, Rong Lin, Peter F. Nielsen, Ole Hansen

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Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research › peer-review

Abstract

With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods for characterization and monitoring of sheet resistance as well as sheet carrier density and mobility via the Micro Hall Effect (MHE) method.

Original language	English
Title of host publication	Proceedings of the 2014 7th International Silicon-Germanium Technology and Device Meeting
Number of pages	2
Publication date	2014
Pages	37-38
DOIs	https://doi.org/10.1109/ISTDM.2014.6874677
Publication status	Published - 2014
Event	2014 7th International Silicon-Germanium Technology and Device Meeting - Singapore, Singapore Duration: 2 Jun 2014 → 4 Jun 2014

Conference

Conference	2014 7th International Silicon-Germanium Technology and Device Meeting
Country/Territory	Singapore
City	Singapore
Period	02/06/2014 → 04/06/2014

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@inbook{5a8cc2cb911449c2a6ffb3ab6051cbe2,

title = "Automated Micro Hall Effect measurements",

abstract = "With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods for characterization and monitoring of sheet resistance as well as sheet carrier density and mobility via the Micro Hall Effect (MHE) method.",

author = "Petersen, {Dirch Hjorth} and Henrichsen, {Henrik Hartmann} and Rong Lin and Nielsen, {Peter F.} and Ole Hansen",

year = "2014",

doi = "10.1109/ISTDM.2014.6874677",

language = "English",

pages = "37--38",

booktitle = "Proceedings of the 2014 7th International Silicon-Germanium Technology and Device Meeting",

note = "2014 7th International Silicon-Germanium Technology and Device Meeting, ISTDM2014 ; Conference date: 02-06-2014 Through 04-06-2014",

}

TY - ABST

T1 - Automated Micro Hall Effect measurements

AU - Petersen, Dirch Hjorth

AU - Henrichsen, Henrik Hartmann

AU - Lin, Rong

AU - Nielsen, Peter F.

AU - Hansen, Ole

PY - 2014

Y1 - 2014

N2 - With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods for characterization and monitoring of sheet resistance as well as sheet carrier density and mobility via the Micro Hall Effect (MHE) method.

AB - With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods for characterization and monitoring of sheet resistance as well as sheet carrier density and mobility via the Micro Hall Effect (MHE) method.

U2 - 10.1109/ISTDM.2014.6874677

DO - 10.1109/ISTDM.2014.6874677

M3 - Conference abstract in proceedings

SP - 37

EP - 38

BT - Proceedings of the 2014 7th International Silicon-Germanium Technology and Device Meeting

T2 - 2014 7th International Silicon-Germanium Technology and Device Meeting

Y2 - 2 June 2014 through 4 June 2014

ER -

Automated Micro Hall Effect measurements

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