Atomic force microscopy measurements of topography and friction in dotriacontane films adsorbed on a $\rm SiO_2$ surface

S. Trogisch, M.J. Simpson, H. Taub, U. G. Volkmann, M. Pino, Flemming Yssing Hansen

Research output: Contribution to journal › Journal article › Research › peer-review

Original language	English
Journal	Virtual Journal of Nanoscale Science & Technology
Issue number	October 31 2005 issue
Pages (from-to)	00
ISSN	1553-9644
Publication status	Published - 2005

Cite this

@article{f0e86fdbf2c34092b417b51c84ab6479,

title = "Atomic force microscopy measurements of topography and friction in dotriacontane films adsorbed on a $\rm SiO_2$ surface",

author = "S. Trogisch and M.J. Simpson and H. Taub and Volkmann, {U. G.} and M. Pino and Hansen, {Flemming Yssing}",

year = "2005",

language = "English",

pages = "00",

journal = "Virtual Journal of Nanoscale Science & Technology",

issn = "1553-9644",

publisher = "American Physical Society",

number = "October 31 2005 issue",

}

Research output: Contribution to journal › Journal article › Research › peer-review

TY - JOUR

T1 - Atomic force microscopy measurements of topography and friction in dotriacontane films adsorbed on a $\rm SiO_2$ surface

AU - Trogisch, S.

AU - Simpson, M.J.

AU - Taub, H.

AU - Volkmann, U. G.

AU - Pino, M.

AU - Hansen, Flemming Yssing

PY - 2005

Y1 - 2005

M3 - Journal article

SP - 00

JO - Virtual Journal of Nanoscale Science & Technology

JF - Virtual Journal of Nanoscale Science & Technology

SN - 1553-9644

IS - October 31 2005 issue

ER -