Abstract
Stacking of solid oxide cells (SOC) requires that a robust and durable electrical contact is established between the cell and the interconnect. In this work, we present a contact layer solution for the SOC air side based on the concept of reactive oxidative bonding in which metallic Mn-Co and Mn-Cu particles are oxidized in-situ during stack initiation or operation to form robust well-conductive spinel oxides. The long-term (3000 h) stability of the new contact layers is evaluated by measuring the area specific resistance (ASR) during aging in air at 750 °C and 850 °C, and during thermal cycling. Both Mn-Co and Mn-Cu layers are found to be well compatible with a CeCo coated 441 steel interconnect material, and do not significantly contribute to the resistance across the stack element. The resistance is dominated by the coated steel.
| Original language | English |
|---|---|
| Journal | Journal of the European Ceramic Society |
| Volume | 44 |
| Issue number | 3 |
| Pages (from-to) | 1678-1687 |
| Number of pages | 10 |
| ISSN | 0955-2219 |
| DOIs | |
| Publication status | Published - 2024 |
Keywords
- Solid Oxide Cell
- Interconnect
- Current collector
- Area Specific Resistance
- Contact layer
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