Application of the method of auxiliary sources in optical diffraction microscopy

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Abstract

The Method of Auxiliary Sources is used for characterisation of grating defects. Grating profiles are characterised by best fit matching of a library of diffraction efficiencies with numerical simulated diffraction efficiencies with defects. It is shown that the presented method can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.
Original languageEnglish
Title of host publicationProgress in Industrial Mathematics at ECMI 2008
Place of PublicationHeidelberg, Dordrecht, London, New York
PublisherSpringer
Publication date2010
Edition1
Pages899-905
ISBN (Print)978-3-642-12109-8
DOIs
Publication statusPublished - 2010
Event15th European Conference on Mathematics for Industry - University College London, London, United Kingdom
Duration: 30 Jun 20084 Jul 2008
http://www.ima.org.uk/ecmi/

Conference

Conference15th European Conference on Mathematics for Industry
LocationUniversity College London
CountryUnited Kingdom
CityLondon
Period30/06/200804/07/2008
Internet address

Keywords

  • nano structures
  • auxiliary sources
  • Optical diffraction
  • Electromagnetic waves

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