Application of the method of auxiliary sources in optical diffraction microscopy

Mirza Karamehmedović; Mads Peter Sørensen; Poul-Erik Hansen; Andrei Lavrinenko

doi:10.1007/978-3-642-12110-4_144

Application of the method of auxiliary sources in optical diffraction microscopy

Mirza Karamehmedović, Mads Peter Sørensen, Poul-Erik Hansen, Andrei Lavrinenko

Technical University of Denmark

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

The Method of Auxiliary Sources is used for characterisation of grating defects. Grating profiles are characterised by best fit matching of a library of diffraction efficiencies with numerical simulated diffraction efficiencies with defects. It is shown that the presented method can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.

Original language	English
Title of host publication	Progress in Industrial Mathematics at ECMI 2008
Place of Publication	Heidelberg, Dordrecht, London, New York
Publisher	Springer
Publication date	2010
Edition	1
Pages	899-905
ISBN (Print)	978-3-642-12109-8
DOIs	https://doi.org/10.1007/978-3-642-12110-4_144
Publication status	Published - 2010
Event	15th European Conference on Mathematics for Industry - University College London, London, United Kingdom Duration: 30 Jun 2008 → 4 Jul 2008 http://www.ima.org.uk/ecmi/

Conference

Conference	15th European Conference on Mathematics for Industry
Location	University College London
Country/Territory	United Kingdom
City	London
Period	30/06/2008 → 04/07/2008
Internet address	http://www.ima.org.uk/ecmi/

Keywords

nano structures
auxiliary sources
Optical diffraction
Electromagnetic waves

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10.1007/978-3-642-12110-4_144

Karamehmedovic08-ecmiSubmitted manuscript, 118 KB

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title = "Application of the method of auxiliary sources in optical diffraction microscopy",

abstract = "The Method of Auxiliary Sources is used for characterisation of grating defects. Grating profiles are characterised by best fit matching of a library of diffraction efficiencies with numerical simulated diffraction efficiencies with defects. It is shown that the presented method can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.",

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booktitle = "Progress in Industrial Mathematics at ECMI 2008",

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Karamehmedović, M , Sørensen, MP, Hansen, P-E & Lavrinenko, A 2010, Application of the method of auxiliary sources in optical diffraction microscopy. in Progress in Industrial Mathematics at ECMI 2008. 1 edn, Springer, Heidelberg, Dordrecht, London, New York, pp. 899-905, 15th European Conference on Mathematics for Industry, London, United Kingdom, 30/06/2008. https://doi.org/10.1007/978-3-642-12110-4_144

Application of the method of auxiliary sources in optical diffraction microscopy. / Karamehmedović, Mirza ; Sørensen, Mads Peter; Hansen, Poul-Erik et al.
Progress in Industrial Mathematics at ECMI 2008. 1. ed. Heidelberg, Dordrecht, London, New York: Springer, 2010. p. 899-905.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Application of the method of auxiliary sources in optical diffraction microscopy

AU - Karamehmedović, Mirza

AU - Sørensen, Mads Peter

AU - Hansen, Poul-Erik

AU - Lavrinenko, Andrei

PY - 2010

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N2 - The Method of Auxiliary Sources is used for characterisation of grating defects. Grating profiles are characterised by best fit matching of a library of diffraction efficiencies with numerical simulated diffraction efficiencies with defects. It is shown that the presented method can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.

AB - The Method of Auxiliary Sources is used for characterisation of grating defects. Grating profiles are characterised by best fit matching of a library of diffraction efficiencies with numerical simulated diffraction efficiencies with defects. It is shown that the presented method can solve the inverse problem with an accuracy usually thought to require rigorous electromagnetic theories.

KW - nano structures

KW - auxiliary sources

KW - Optical diffraction

KW - Electromagnetic waves

U2 - 10.1007/978-3-642-12110-4_144

DO - 10.1007/978-3-642-12110-4_144

M3 - Article in proceedings

SN - 978-3-642-12109-8

SP - 899

EP - 905

BT - Progress in Industrial Mathematics at ECMI 2008

PB - Springer

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T2 - 15th European Conference on Mathematics for Industry

Y2 - 30 June 2008 through 4 July 2008

ER -

Application of the method of auxiliary sources in optical diffraction microscopy

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Keywords

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