Application of nanometrology to polymer production

Jørgen Garnaes, Simone Tanzi, Matteo Calaon, Jiri Cech, Rafael J. Taboryski, Hans Nørgaard Hansen, Jesper Nørregaard, Morten Hannibal Madsen, Poul-Erik Hansen, Mads Rostgaard Sonne, Henrik Pranov, Guggi Kofod, Yee Cheong Lam, Jesper Henri Hattel, Marco Matteucci, Thomas Lehrmann Christiansen, Søren Friis, Mette Thylstrup Christensen, Wei Li, Sandra WilsonJonatan Kutchinsky, Guido Tosello

Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

Original languageEnglish
Publication date2013
Number of pages1
Publication statusPublished - 2013
Event16th International Congress of Metrology - Parisf, France
Duration: 7 Oct 201310 Oct 2013
Conference number: 16

Conference

Conference16th International Congress of Metrology
Number16
CountryFrance
CityParisf
Period07/10/201310/10/2013

Cite this

Garnaes, J., Tanzi, S., Calaon, M., Cech, J., Taboryski, R. J., Hansen, H. N., Nørregaard, J., Madsen, M. H., Hansen, P-E., Sonne, M. R., Pranov, H., Kofod, G., Lam, Y. C., Hattel, J. H., Matteucci, M., Christiansen, T. L., Friis, S., Thylstrup Christensen, M., Li, W., ... Tosello, G. (2013). Application of nanometrology to polymer production. Abstract from 16th International Congress of Metrology, Parisf, France.