Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

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An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.
Original languageEnglish
JournalMicromachines
Volume7
Issue number9
Number of pages7
ISSN2072-666X
DOIs
Publication statusPublished - 2016
CitationsWeb of Science® Times Cited: No match on DOI

    Research areas

  • Rapid Thermal Process, Self-assembled Nanopattern, Antireflective Surface, Sub-wavelength, Structure, Silicon Carbide

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