Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

Yiyu Ou, Ahmed Fadil, Haiyan Ou

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.
Original languageEnglish
JournalMicromachines
Volume7
Issue number9
Number of pages7
ISSN2072-666X
DOIs
Publication statusPublished - 2016

Keywords

  • Rapid Thermal Process
  • Self-assembled Nanopattern
  • Antireflective Surface
  • Sub-wavelength
  • Structure
  • Silicon Carbide

Cite this

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title = "Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning",
abstract = "An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.",
keywords = "Rapid Thermal Process, Self-assembled Nanopattern, Antireflective Surface, Sub-wavelength, Structure, Silicon Carbide",
author = "Yiyu Ou and Ahmed Fadil and Haiyan Ou",
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Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning. / Ou, Yiyu; Fadil, Ahmed; Ou, Haiyan.

In: Micromachines, Vol. 7, No. 9, 2016.

Research output: Contribution to journalJournal articleResearchpeer-review

TY - JOUR

T1 - Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

AU - Ou, Yiyu

AU - Fadil, Ahmed

AU - Ou, Haiyan

PY - 2016

Y1 - 2016

N2 - An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.

AB - An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.

KW - Rapid Thermal Process

KW - Self-assembled Nanopattern

KW - Antireflective Surface

KW - Sub-wavelength

KW - Structure

KW - Silicon Carbide

U2 - 10.3390/mi7090152

DO - 10.3390/mi7090152

M3 - Journal article

VL - 7

JO - Micromachines

JF - Micromachines

SN - 2072-666X

IS - 9

ER -