An etching mask and a method to produce an etching mask

Sozaraj Rasappa (Inventor), Sokol Ndoni (Inventor), Lars Schulte (Inventor), Michael A. Morris (Inventor), Dipu Borah (Inventor), Ramsankar Senthamaraikannan (Inventor)

Research output: Patent

193 Downloads (Pure)


The present invention relates to an etching mask comprising silicon containing block copolymers produced by self-assembly techniques onto silicon or graphene substrate. Through the use of the etching mask, nanostructures having long linear features having sub-10 nm width can be produced.

Original languageEnglish
IPCG03F 7/ 00 A I
Patent numberWO2016177888
Filing date10/11/2016
CountryInternational Bureau of the World Intellectual Property Organization (WIPO)
Priority date06/05/2015
Priority numberEP20150166573
Publication statusPublished - 10 Nov 2016

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