Aggressive media exposed differential pressure sensor with a deposited membrane

Salim Bouaidat; Gert Friis Eriksen; Roger De Reus; Siebe Bouwstra

doi:10.1109/MEMSYS.2001.906502

Aggressive media exposed differential pressure sensor with a deposited membrane

Salim Bouaidat, Gert Friis Eriksen, Roger De Reus, Siebe Bouwstra

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70°C for 20 hours did not change their performance.

Original language	English
Title of host publication	Proceedings of The 14th IEEE International Conference on Micro Electro Mechanical Systems
Publisher	IEEE
Publication date	2001
Pages	155-158
ISBN (Print)	0-7803-5998-4
DOIs	https://doi.org/10.1109/MEMSYS.2001.906502
Publication status	Published - 2001
Event	14th IEEE International Conference on Micro Electro Mechanical Systems - Interlaken, Switzerland Duration: 21 Jan 2001 → 25 Jan 2001 Conference number: 14

Conference

Conference	14th IEEE International Conference on Micro Electro Mechanical Systems
Number	14
Country/Territory	Switzerland
City	Interlaken
Period	21/01/2001 → 25/01/2001

Bibliographical note

Copyright: 2000 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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@inproceedings{7349fc82120041d88d8604356f356382,

title = "Aggressive media exposed differential pressure sensor with a deposited membrane",

abstract = "A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70°C for 20 hours did not change their performance.",

author = "Salim Bouaidat and Eriksen, {Gert Friis} and Reus, {Roger De} and Siebe Bouwstra",

note = "Copyright: 2000 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE; 14th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2001 ; Conference date: 21-01-2001 Through 25-01-2001",

year = "2001",

doi = "10.1109/MEMSYS.2001.906502",

language = "English",

isbn = "0-7803-5998-4",

pages = "155--158",

booktitle = "Proceedings of The 14th IEEE International Conference on Micro Electro Mechanical Systems",

publisher = "IEEE",

address = "United States",

}

Bouaidat, S, Eriksen, GF, Reus, RD & Bouwstra, S 2001, Aggressive media exposed differential pressure sensor with a deposited membrane. in Proceedings of The 14th IEEE International Conference on Micro Electro Mechanical Systems. IEEE, pp. 155-158, 14th IEEE International Conference on Micro Electro Mechanical Systems, Interlaken, Switzerland, 21/01/2001. https://doi.org/10.1109/MEMSYS.2001.906502

Aggressive media exposed differential pressure sensor with a deposited membrane. / Bouaidat, Salim; Eriksen, Gert Friis; Reus, Roger De et al.
Proceedings of The 14th IEEE International Conference on Micro Electro Mechanical Systems. IEEE, 2001. p. 155-158.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Aggressive media exposed differential pressure sensor with a deposited membrane

AU - Bouaidat, Salim

AU - Eriksen, Gert Friis

AU - Reus, Roger De

AU - Bouwstra, Siebe

N1 - Conference code: 14

PY - 2001

Y1 - 2001

N2 - A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70°C for 20 hours did not change their performance.

AB - A new piezoresistive differential pressure sensor design for harsh wet environments is presented. The sensor design is based on a deposited membrane, which is deposited on top of polysilicon interconnects and piezoresistors. Flat membrane surfaces are thereby achieved. This enables thin film protective coating using sputtered films, which usually have poor step coverage. The concept is demonstrated using both epipoly silicon and sputtered amorphous silicon as membrane materials and tantalum oxide as coating material. Using polysilicon piezoresistors, a sensitivity of 11.3 mV/V bar was obtained. Exposure of the sensors with sputtered amorphous silicon membranes to aggressive media with pH 11 and 70°C for 20 hours did not change their performance.

U2 - 10.1109/MEMSYS.2001.906502

DO - 10.1109/MEMSYS.2001.906502

M3 - Article in proceedings

SN - 0-7803-5998-4

SP - 155

EP - 158

BT - Proceedings of The 14th IEEE International Conference on Micro Electro Mechanical Systems

PB - IEEE

T2 - 14th IEEE International Conference on Micro Electro Mechanical Systems

Y2 - 21 January 2001 through 25 January 2001

ER -

Aggressive media exposed differential pressure sensor with a deposited membrane

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