AFM lithography of aluminum for fabrication of nanomechanical systems

Zachary James Davis, G. Abadal, Ole Hansen, X. Borisé, N. Barniol, F. Perez-Murano, Anja Boisen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Nanolithography by local anodic oxidation of surfaces using atomic force microscopy (AFM) has proven to be more reproducible when using dynamic, non-contact mode. Hereby, the tip/sample interaction forces are reduced dramatically compared to contact mode, and thus tip wear is greatly reduced. Anodic oxidation of Al can be used for fabricating nanomechanical systems, by using the Al oxide as a highly selective dry etching mask. In our experiments, areas as large as 2 mum x 3 mum have been oxidized repeatedly without any sign of tip-wear. Furthermore, line widths down to 10 nm have been routinely obtained, by optimization of AFM parameters, such as tip/sample distance, voltage and scan speed. Finally, AFM oxidation experiments have been performed on CMOS processed chips, demonstrating the first steps of fabricating fully functional nanomechanical devices. (C) 2003 Elsevier Science B.V. All rights reserved.
    Original languageEnglish
    JournalUltramicroscopy
    Volume97
    Issue number1-4
    Pages (from-to)467-472
    ISSN0304-3991
    DOIs
    Publication statusPublished - 2003

    Cite this

    Davis, Zachary James ; Abadal, G. ; Hansen, Ole ; Borisé, X. ; Barniol, N. ; Perez-Murano, F. ; Boisen, Anja. / AFM lithography of aluminum for fabrication of nanomechanical systems. In: Ultramicroscopy. 2003 ; Vol. 97, No. 1-4. pp. 467-472.
    @article{53ac0a0a89ee4ef79782fd8479363d32,
    title = "AFM lithography of aluminum for fabrication of nanomechanical systems",
    abstract = "Nanolithography by local anodic oxidation of surfaces using atomic force microscopy (AFM) has proven to be more reproducible when using dynamic, non-contact mode. Hereby, the tip/sample interaction forces are reduced dramatically compared to contact mode, and thus tip wear is greatly reduced. Anodic oxidation of Al can be used for fabricating nanomechanical systems, by using the Al oxide as a highly selective dry etching mask. In our experiments, areas as large as 2 mum x 3 mum have been oxidized repeatedly without any sign of tip-wear. Furthermore, line widths down to 10 nm have been routinely obtained, by optimization of AFM parameters, such as tip/sample distance, voltage and scan speed. Finally, AFM oxidation experiments have been performed on CMOS processed chips, demonstrating the first steps of fabricating fully functional nanomechanical devices. (C) 2003 Elsevier Science B.V. All rights reserved.",
    author = "Davis, {Zachary James} and G. Abadal and Ole Hansen and X. Boris{\'e} and N. Barniol and F. Perez-Murano and Anja Boisen",
    year = "2003",
    doi = "10.1016/S0304-3991(03)00075-5",
    language = "English",
    volume = "97",
    pages = "467--472",
    journal = "Ultramicroscopy",
    issn = "0304-3991",
    publisher = "Elsevier",
    number = "1-4",

    }

    Davis, ZJ, Abadal, G, Hansen, O, Borisé, X, Barniol, N, Perez-Murano, F & Boisen, A 2003, 'AFM lithography of aluminum for fabrication of nanomechanical systems', Ultramicroscopy, vol. 97, no. 1-4, pp. 467-472. https://doi.org/10.1016/S0304-3991(03)00075-5

    AFM lithography of aluminum for fabrication of nanomechanical systems. / Davis, Zachary James; Abadal, G.; Hansen, Ole; Borisé, X.; Barniol, N.; Perez-Murano, F.; Boisen, Anja.

    In: Ultramicroscopy, Vol. 97, No. 1-4, 2003, p. 467-472.

    Research output: Contribution to journalJournal articleResearchpeer-review

    TY - JOUR

    T1 - AFM lithography of aluminum for fabrication of nanomechanical systems

    AU - Davis, Zachary James

    AU - Abadal, G.

    AU - Hansen, Ole

    AU - Borisé, X.

    AU - Barniol, N.

    AU - Perez-Murano, F.

    AU - Boisen, Anja

    PY - 2003

    Y1 - 2003

    N2 - Nanolithography by local anodic oxidation of surfaces using atomic force microscopy (AFM) has proven to be more reproducible when using dynamic, non-contact mode. Hereby, the tip/sample interaction forces are reduced dramatically compared to contact mode, and thus tip wear is greatly reduced. Anodic oxidation of Al can be used for fabricating nanomechanical systems, by using the Al oxide as a highly selective dry etching mask. In our experiments, areas as large as 2 mum x 3 mum have been oxidized repeatedly without any sign of tip-wear. Furthermore, line widths down to 10 nm have been routinely obtained, by optimization of AFM parameters, such as tip/sample distance, voltage and scan speed. Finally, AFM oxidation experiments have been performed on CMOS processed chips, demonstrating the first steps of fabricating fully functional nanomechanical devices. (C) 2003 Elsevier Science B.V. All rights reserved.

    AB - Nanolithography by local anodic oxidation of surfaces using atomic force microscopy (AFM) has proven to be more reproducible when using dynamic, non-contact mode. Hereby, the tip/sample interaction forces are reduced dramatically compared to contact mode, and thus tip wear is greatly reduced. Anodic oxidation of Al can be used for fabricating nanomechanical systems, by using the Al oxide as a highly selective dry etching mask. In our experiments, areas as large as 2 mum x 3 mum have been oxidized repeatedly without any sign of tip-wear. Furthermore, line widths down to 10 nm have been routinely obtained, by optimization of AFM parameters, such as tip/sample distance, voltage and scan speed. Finally, AFM oxidation experiments have been performed on CMOS processed chips, demonstrating the first steps of fabricating fully functional nanomechanical devices. (C) 2003 Elsevier Science B.V. All rights reserved.

    U2 - 10.1016/S0304-3991(03)00075-5

    DO - 10.1016/S0304-3991(03)00075-5

    M3 - Journal article

    VL - 97

    SP - 467

    EP - 472

    JO - Ultramicroscopy

    JF - Ultramicroscopy

    SN - 0304-3991

    IS - 1-4

    ER -