Advances in the chemical vapor deposition (CVD) of Tantalum

James Atwoki Mugabi, Søren Eriksen, Erik Christensen, Irina Petrushina, Niels J. Bjerrum

Research output: Contribution to journalConference abstract in journalResearchpeer-review

Abstract

The chemical stability of tantalum in hot acidic media has made it a key material in the protection of industrial equipment from corrosion under such conditions. The Chemical Vapor Deposition of tantalum to achieve such thin corrosion resistant coatings is one of the most widely mentioned examples of CVD processes; however very little information on the process and its characteristics can be found. This work presents the state of the art on the CVD of tantalum in long narrow channels and a reaction mechanism is suggested based on a rudimentary model. The effects of the system pressure, temperature and process-setup on the deposition rates and material distribution are also presented.
Original languageEnglish
JournalABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume247
ISSN0065-7727
Publication statusPublished - 2014
Event247th ACS National Meeting: Chemistry & Materials for Energy - Omni Hotel, Dallas, United States
Duration: 16 Mar 201420 Mar 2014
Conference number: 247

Conference

Conference247th ACS National Meeting
Number247
LocationOmni Hotel
CountryUnited States
CityDallas
Period16/03/201420/03/2014

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