Atomic Force Microscopy (AFM) is being increasingly employed in industrial micro/nano manufacturing applications and integrated into production lines. In order to achieve reliable process and product control at high measuring speed, instrument optimization is needed. Quantitative AFM measurement results are influenced by a number of scan settings parameters, defining topography sampling and measurement time: resolution (number of profiles and points per profile), scan range and direction, scanning force and speed. Such parameters are influencing lateral and vertical accuracy and, eventually, the estimated dimensions of measured features. The definition of scan settings is based on a comprehensive optimization that targets maximization of information from collected data and minimization of measurement uncertainty and scan time. The Design of Experiments (DOE) technique is proposed and applied to perform the optimization of AFM measurements on calibrated one-dimensional silicon grating featuring a triangular periodical profile (slopes of 54.7 degrees, period of 3 μm).
|Title of host publication||Proceedings of the euspen International Conference|
|Publication status||Published - 2010|
|Event||10th International Conference of the European Society for Precision Engineering and Nanotechnology - Zürich, Switzerland|
Duration: 18 May 2008 → 22 May 2008
Conference number: 10
|Conference||10th International Conference of the European Society for Precision Engineering and Nanotechnology|
|Period||18/05/2008 → 22/05/2008|