A statistical approach for measuring dislocations in 2D photonic crystals

Radu Malureanu; Lars Hagedorn Frandsen

doi:10.1109/ICONN.2008.4639281

A statistical approach for measuring dislocations in 2D photonic crystals

Radu Malureanu, Lars Hagedorn Frandsen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01nm error, we establish the statistical disorder within such devices.

Original language	English
Title of host publication	International Conference on Nanoscience and Nanotechnology
Place of Publication	Melbourne, Australia
Publisher	IEEE
Publication date	2008
Pages	200-202
ISBN (Print)	14-24-41503-9
DOIs	https://doi.org/10.1109/ICONN.2008.4639281
Publication status	Published - 2008
Event	International Conference on Nanoscience and Nanotechnology - Melbourne, Australia Duration: 1 Jan 2008 → …

Conference

Conference	International Conference on Nanoscience and Nanotechnology
City	Melbourne, Australia
Period	01/01/2008 → …

Bibliographical note

Copyright: 2008 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

Keywords

placement accuracy
AFM measures
photonic crystals

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10.1109/ICONN.2008.4639281

MalureanuFinal published version, 211 KB

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KW - AFM measures

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A statistical approach for measuring dislocations in 2D photonic crystals

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Keywords

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