A Simplified Diffusion-Deposition Model

Niels Otto Jensen

    Research output: Contribution to journalJournal articleResearchpeer-review


    The use of a simple top hat plume model facilitates an analytical treatment of the deposition problem. A necessary constraint, however, is that the diffusion velocity (e.g., in terms of the plume growth-rate) is large compared to the deposition velocity. With these limitations, explicit formulae for downwind deposition amounts and ground level atmospheric concentrations are given.
    Original languageEnglish
    JournalAtmospheric Environment
    Issue number8
    Pages (from-to)953-956
    Publication statusPublished - 1980


    Dive into the research topics of 'A Simplified Diffusion-Deposition Model'. Together they form a unique fingerprint.

    Cite this