A simple electron-beam lithography system

Kristian Mølhave, Dorte Nørgaard Madsen, Peter Bøggild

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.
    Original languageEnglish
    JournalUltramicroscopy
    Volume102
    Issue number3
    Pages (from-to)215-219
    ISSN0304-3991
    DOIs
    Publication statusPublished - Feb 2005

    Keywords

    • e-Beam lithography
    • electron optics
    • SEM
    • electron-beam deposition
    • electron-beam-induced deposition

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