A simple electron-beam lithography system

Kristian Mølhave; Dorte Nørgaard Madsen; Peter Bøggild

doi:10.1016/j.ultramic.2004.09.011

A simple electron-beam lithography system

Kristian Mølhave, Dorte Nørgaard Madsen, Peter Bøggild

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.

Original language	English
Journal	Ultramicroscopy
Volume	102
Issue number	3
Pages (from-to)	215-219
ISSN	0304-3991
DOIs	https://doi.org/10.1016/j.ultramic.2004.09.011
Publication status	Published - Feb 2005

Keywords

e-Beam lithography
electron optics
SEM
electron-beam deposition
electron-beam-induced deposition

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@article{4568b224e240483f8c5838424c36e612,

title = "A simple electron-beam lithography system",

abstract = "A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved. ",

keywords = "e-Beam lithography, electron optics, SEM, electron-beam deposition, electron-beam-induced deposition ",

author = "Kristian M{\o}lhave and Madsen, {Dorte N{\o}rgaard} and Peter B{\o}ggild",

year = "2005",

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doi = "10.1016/j.ultramic.2004.09.011",

language = "English",

volume = "102",

pages = "215--219",

journal = "Ultramicroscopy",

issn = "0304-3991",

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TY - JOUR

T1 - A simple electron-beam lithography system

AU - Mølhave, Kristian

AU - Madsen, Dorte Nørgaard

AU - Bøggild, Peter

PY - 2005/2

Y1 - 2005/2

N2 - A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.

AB - A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.

KW - e-Beam lithography

KW - electron optics

KW - SEM

KW - electron-beam deposition

KW - electron-beam-induced deposition

U2 - 10.1016/j.ultramic.2004.09.011

DO - 10.1016/j.ultramic.2004.09.011

M3 - Journal article

VL - 102

SP - 215

EP - 219

JO - Ultramicroscopy

JF - Ultramicroscopy

SN - 0304-3991

IS - 3

ER -