A profiling platform at 915, 1075, and 1090nm

David Bue Pedersen, Klaus Schütt Hansen, Jakob Skov Nielsen, Flemming Ove Olsen, Hans Nørgaard Hansen

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearch

Original languageEnglish
Title of host publication12th NOLAMP conference 2009
Publication date2009
Publication statusPublished - 2009
Event12th Nordic Laser Materials Processing Conference - Copenhagen, Denmark
Duration: 24 Aug 200926 Aug 2009

Conference

Conference12th Nordic Laser Materials Processing Conference
Country/TerritoryDenmark
CityCopenhagen
Period24/08/200926/08/2009

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