A METHOD FOR PREPARING A SUBSTRATE BY APPLYING A SAMPLE TO BE ANALYSED

Onur Durucan (Inventor), Michael, Stenbæk Schmidt (Inventor), Tomas Rindzevicius (Inventor), Anja Boisen (Inventor)

Research output: Patent

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Abstract

The invention relates to a method for preparing a substrate (105a) comprising a sample reception area (110) and a sensing area (111). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

Original languageEnglish
IPCG01N 35/ 00 A I
Patent numberWO2017191080
Filing date09/11/2017
CountryInternational Bureau of the World Intellectual Property Organization (WIPO)
Priority date02/05/2016
Priority numberEP20160167956
Publication statusPublished - 9 Nov 2017

Cite this

Durucan, O., Schmidt, M. S., Rindzevicius, T., & Boisen, A. (2017). IPC No. G01N 35/ 00 A I. A METHOD FOR PREPARING A SUBSTRATE BY APPLYING A SAMPLE TO BE ANALYSED. (Patent No. WO2017191080).