A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RESIST

Anpan Han (Inventor), William Tiddi (Inventor), Marco Beleggia (Inventor)

    Research output: Patent

    195 Downloads (Pure)

    Abstract

    The invention relates to a method for creating an organic resist on a surface of a cooled substrate, the method comprising the steps of condensing a vapour into a solid film on the surface of the cooled substrate; patterning at least part of the solid film by exposing selected portions of said solid film to at least one electron beam thereby creating the organic resist on 5 the surface of the cooled substrate in accordance with a predetermined pattern; wherein the created organic resist remains essentially intact at ambient conditions; and using the created organic resist as a mask for creating semiconductor structures and/or semiconductor devices.

    Original languageEnglish
    IPCB29C 67/ 00 A I
    Patent numberWO2017191079
    Filing date09/11/2017
    Country/TerritoryInternational Bureau of the World Intellectual Property Organization (WIPO)
    Priority date02/05/2016
    Priority numberEP20160167903
    Publication statusPublished - 9 Nov 2017

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