Abstract
The invention relates to a method for creating an organic resist on a surface of a cooled substrate, the method comprising the steps of condensing a vapour into a solid film on the surface of the cooled substrate; patterning at least part of the solid film by exposing selected portions of said solid film to at least one electron beam thereby creating the organic resist on 5 the surface of the cooled substrate in accordance with a predetermined pattern; wherein the created organic resist remains essentially intact at ambient conditions; and using the created organic resist as a mask for creating semiconductor structures and/or semiconductor devices.
Original language | English |
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IPC | B29C 67/ 00 A I |
Patent number | WO2017191079 |
Filing date | 09/11/2017 |
Country/Territory | International Bureau of the World Intellectual Property Organization (WIPO) |
Priority date | 02/05/2016 |
Priority number | EP20160167903 |
Publication status | Published - 9 Nov 2017 |