A complete Raman mapping of phase transitions in Si under indentation

C. R. Das, H. C. Hsu, S. Dhara, A. K. Bhaduri, B. Raj, L. C. Chen, K. H. Chen, S. K. Albert, A. Ray, Y. Tzeng

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

Crystalline Si substrates are studied for pressure-induced phase transformation under indentation at room temperature (RT) using a Berkovich tip. Raman spectroscopy, as a nondestructive tool, is used for the identification of the transformed phases. Raman lines as well as area mapping are used for locating the phases in the indented region. Calculation of pressure contours in the indented region is used for understanding the phase distribution. We report here a comprehensive study of all the phases of Si, reported so far, leading to possible understanding of material properties useful for possible electromechanical applications. As a major finding, distribution of the amorphous phase in the indented region deviates from the conventional wisdom of being in the central region alone. We present phase mapping results for both Si(100) and Si(111) substrates. Copyright (C) 2009 John Wiley & Sons, Ltd.
Original languageEnglish
JournalJournal of Raman Spectroscopy
Volume41
Issue number3
Pages (from-to)334-339
ISSN0377-0486
DOIs
Publication statusPublished - 2010
Externally publishedYes

Keywords

  • Amorphization
  • Indentation
  • Phase transition
  • Raman spectroscopy
  • Si

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