5-nm-lines in Organic Ice Resists

Anna Elsukova; Anpan Han; Marco Beleggia

Abstract

Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination. In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].

Original language	English
Publication date	2018
Number of pages	1
Publication status	Published - 2018
Event	44th International conference on Micro and Nano Engineering - Copenhagen, Denmark Duration: 24 Sept 2018 → 27 Sept 2018 Conference number: 44 http://mne2018.org

Conference

Conference	44th International conference on Micro and Nano Engineering
Number	44
Country/Territory	Denmark
City	Copenhagen
Period	24/09/2018 → 27/09/2018
Internet address	http://mne2018.org

Keywords

Nanofabrication
Lithography
Organic ice resists
Environmental TEM

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title = "5-nm-lines in Organic Ice Resists",

abstract = "Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination. In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].",

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T1 - 5-nm-lines in Organic Ice Resists

AU - Elsukova, Anna

AU - Han, Anpan

AU - Beleggia, Marco

N1 - Conference code: 44

PY - 2018

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N2 - Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination. In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].

AB - Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination. In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].

KW - Nanofabrication

KW - Lithography

KW - Organic ice resists

KW - Environmental TEM

M3 - Conference abstract for conference

T2 - 44th International conference on Micro and Nano Engineering

Y2 - 24 September 2018 through 27 September 2018

ER -