5-nm-lines in Organic Ice Resists

Anna Elsukova, Anpan Han, Marco Beleggia

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Abstract

Organic Ice Resist Lithography (OIRL) is a novel one-step method for patterning nanostructures using a thin frozen layer of beam sensitive organic material [1]. Fig. 1 sketches the basic implementation of OIRL. The entire process takes place in a single instrument, does not require cleanroom environment or any additional chemicals and is free of residual resist contamination. In our recently published work [1] we have demonstrated the advantages of OIRL over other lithography methods, such as easy handling of fragile and non-planar surfaces and effective fabrication of 3D materials. OIRL was performed in our custom-built modified scanning electron microscope (SEM) [2].
Original languageEnglish
Publication date2018
Number of pages1
Publication statusPublished - 2018
Event44th International conference on Micro and Nano Engineering - Copenhagen, Denmark
Duration: 24 Sep 201827 Sep 2018
Conference number: 44
http://mne2018.org

Conference

Conference44th International conference on Micro and Nano Engineering
Number44
CountryDenmark
CityCopenhagen
Period24/09/201827/09/2018
Internet address

Keywords

  • Nanofabrication
  • Lithography
  • Organic ice resists
  • Environmental TEM

Cite this

Elsukova, A., Han, A., & Beleggia, M. (2018). 5-nm-lines in Organic Ice Resists. Abstract from 44th International conference on Micro and Nano Engineering, Copenhagen, Denmark.