3D Simulation of Nano-Imprint Lithography

José Manuel Román Marín, Henrik K. Rasmussen, Ole Hassager

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwards type. We have used a 3D Lagrangian Galerkin finite element methods implemented on a parallel computer architecture. In a Lagrangian techniques, the node point follows the particle movement, allowing for the movement of free surfaces or interfaces. We have extended the method to handle the dynamic movement of the contact line between the polymer melt and stamp during mold filling.
Original languageEnglish
JournalNanoscale Research Letters
Volume5
Issue number2
Pages (from-to)274-278
ISSN1931-7573
DOIs
Publication statusPublished - 2010

Keywords

  • MSF
  • NIL
  • Viscoelastic
  • Nano-imprint
  • Lagrangian
  • Finite element

Cite this

Román Marín, José Manuel ; Rasmussen, Henrik K. ; Hassager, Ole. / 3D Simulation of Nano-Imprint Lithography. In: Nanoscale Research Letters. 2010 ; Vol. 5, No. 2. pp. 274-278.
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3D Simulation of Nano-Imprint Lithography. / Román Marín, José Manuel; Rasmussen, Henrik K.; Hassager, Ole.

In: Nanoscale Research Letters, Vol. 5, No. 2, 2010, p. 274-278.

Research output: Contribution to journalJournal articleResearchpeer-review

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AU - Hassager, Ole

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