20 nm Nanoimprint Lithography Stamps RIE-Etched in Silicon Using Carbon Nanotubes as Etch Masks

Michael Stenbæk Schmidt; Theodor Nielsen; T. Schurmann; Dorte Nørgaard Madsen; Anders Kristensen; Peter Bøggild

20 nm Nanoimprint Lithography Stamps RIE-Etched in Silicon Using Carbon Nanotubes as Etch Masks

Michael Stenbæk Schmidt
, Theodor Nielsen
, T. Schurmann
, Dorte Nørgaard Madsen
, Anders Kristensen
, Peter Bøggild

Research output: Contribution to conference › Poster › Research

Original language	English
Publication date	2005
Publication status	Published - 2005
Event	Material Research Society Annual Meeting - San Francisco, United States Duration: 28 Mar 2005 → 1 Apr 2005

Conference

Conference	Material Research Society Annual Meeting
Country/Territory	United States
City	San Francisco
Period	28/03/2005 → 01/04/2005

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Cite this

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title = "20 nm Nanoimprint Lithography Stamps RIE-Etched in Silicon Using Carbon Nanotubes as Etch Masks",

author = "Schmidt, \{Michael Stenb{\ae}k\} and Theodor Nielsen and T. Schurmann and Madsen, \{Dorte N{\o}rgaard\} and Anders Kristensen and Peter B{\o}ggild",

year = "2005",

language = "English",

note = "Material Research Society Annual Meeting ; Conference date: 28-03-2005 Through 01-04-2005",

}

TY - CONF

T1 - 20 nm Nanoimprint Lithography Stamps RIE-Etched in Silicon Using Carbon Nanotubes as Etch Masks

AU - Schmidt, Michael Stenbæk

AU - Nielsen, Theodor

AU - Schurmann, T.

AU - Madsen, Dorte Nørgaard

AU - Kristensen, Anders

AU - Bøggild, Peter

PY - 2005

Y1 - 2005

M3 - Poster

T2 - Material Research Society Annual Meeting

Y2 - 28 March 2005 through 1 April 2005

ER -