20 nm Nanoimprint Lithography Stamps RIE-Etched in Silicon Using Carbon Nanotubes as Etch Masks

Michael Stenbæk Schmidt, Theodor Nielsen, T. Schurmann, Dorte Nørgaard Madsen, Anders Kristensen, Peter Bøggild

    Research output: Contribution to conferencePosterResearch

    Original languageEnglish
    Publication date2005
    Publication statusPublished - 2005
    EventMaterial Research Society Annual Meeting - San Francisco, CA, United States
    Duration: 28 Mar 20051 Apr 2005

    Conference

    ConferenceMaterial Research Society Annual Meeting
    CountryUnited States
    CitySan Francisco, CA
    Period28/03/200501/04/2005

    Cite this