Chemical Vapor Deposition (CVD)

Project Details


The primary objective of the CVD-research is tantalum coating of stainless steel, carbon steel, nickel, copper, titanium and aluminum by CVD. Tantalum is deposited from TaCl5 by reduction with hydrogen at 625-1000 C. The TaCl5 is generated directly from Ta and Cl2 at 400-600 C prior to mixing with H2 and heating to the deposition temperature. Niobium and tungsten coatings are deposited by similar processes.
Catalytically active platinum layers has been prepared by metalorganic-CVD. Platinum is deposited from platinum bis penta-2,4-dion in hydrogen at 300 C and 0,1 mbar.
Copper deposition on nickelbased alloys from copper bis 1,1,1,5,5,5-hexafluoropenta-2,4-dion is a new CVD activity and subject of a PMP (3 students).
Effective start/end date01/01/1995 → …


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