DescriptionPulsed laser deposition (PLD) is one of the most effective methods for fabricating and controlling the composition ratio of thin films. PLD is especially appropriate for the growth of oxides, since an oxygen background can be supplied during deposition to decrease the oxygen loss. In this paper, we report on the fabrication of the Cu2ZnSnS4 thin films by pulsed laser deposition from a multi-component oxide target of CZTO in vacuum followed by annealing in a sulfur atmosphere. The laser fluence was appropriately varied for controlling the composition of the oxide thin film precursors, following a similar approach as in the case of the sulfide precursors.
|Period||8 Nov 2017 → 10 Nov 2017|
|Held at||STARCELL, Spain|
- pulsed laser deposition
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Research output: Contribution to conference › Poster › Research › peer-review