Organic ice resists: condensed small molecules as spin-free volatile E-beam resists

Activity: Talks and presentationsConference presentations

View graph of relations

William Tiddi - Speaker

We developed a novel technique using frozen alcohols and other simple organic molecules for lithography applications. The desired chemical (e.g. anisole, nonane) is condensed from vapor phase at cryogenic temperature to form a frozen thin film demonstrating resist-like capabilities.
Arbitrary patterns are defined into this organic ice resist (OIR) as in conventional e-beam lithography; exposed areas are stable in air at ambient condition while unexposed ice vanishes, sublimating away once the sample returns to room temperature. No spin coating or development steps are needed: everything happens in a single tool, while remaining compatible with other processing and characterization techniques. As an example, we demonstrate silicon nanowires fabrication using OIR as a protective mask for plasma etch, transferring the line features into the underlying silicon substrate.
18 Sep 201722 Sep 2017

Event (Conference)

Title43rd International conference on Micro and Nano Engineering
Abbreviated titleMNE 2017
Date18/09/201722/09/2017
CityBraga
CountryPortugal
Download as:
Download as PDF
Select render style:
ShortLong
PDF
Download as HTML
Select render style:
ShortLong
HTML
Download as Word
Select render style:
ShortLong
Word

ID: 140682816