Organic ice resists: condensed small molecules as spin-free volatile E-beam resists

Description

We developed a novel technique using frozen alcohols and other simple organic molecules for lithography applications. The desired chemical (e.g. anisole, nonane) is condensed from vapor phase at cryogenic temperature to form a frozen thin film demonstrating resist-like capabilities.
Arbitrary patterns are defined into this organic ice resist (OIR) as in conventional e-beam lithography; exposed areas are stable in air at ambient condition while unexposed ice vanishes, sublimating away once the sample returns to room temperature. No spin coating or development steps are needed: everything happens in a single tool, while remaining compatible with other processing and characterization techniques. As an example, we demonstrate silicon nanowires fabrication using OIR as a protective mask for plasma etch, transferring the line features into the underlying silicon substrate.

Period	18 Sep 2017 → 22 Sep 2017
Event title	43rd International conference on Micro and Nano Engineering
Event type	Conference
Conference number	43
Location	Braga, Portugal
Degree of Recognition	International