Organic ice resists: condensed small molecules as spin-free volatile E-beam resists

William Tiddi (Speaker)

    Activity: Talks and presentationsConference presentations

    Description

    We developed a novel technique using frozen alcohols and other simple organic molecules for lithography applications. The desired chemical (e.g. anisole, nonane) is condensed from vapor phase at cryogenic temperature to form a frozen thin film demonstrating resist-like capabilities.
    Arbitrary patterns are defined into this organic ice resist (OIR) as in conventional e-beam lithography; exposed areas are stable in air at ambient condition while unexposed ice vanishes, sublimating away once the sample returns to room temperature. No spin coating or development steps are needed: everything happens in a single tool, while remaining compatible with other processing and characterization techniques. As an example, we demonstrate silicon nanowires fabrication using OIR as a protective mask for plasma etch, transferring the line features into the underlying silicon substrate.
    Period18 Sep 201722 Sep 2017
    Event title43rd International conference on Micro and Nano Engineering
    Event typeConference
    Conference number43
    LocationBraga, Portugal
    Degree of RecognitionInternational