Description
We developed a novel technique using frozen alcohols and other simple organic molecules for lithography applications. The desired chemical (e.g. anisole, nonane) is condensed from vapor phase at cryogenic temperature to form a frozen thin film demonstrating resist-like capabilities.Arbitrary patterns are defined into this organic ice resist (OIR) as in conventional e-beam lithography; exposed areas are stable in air at ambient condition while unexposed ice vanishes, sublimating away once the sample returns to room temperature. No spin coating or development steps are needed: everything happens in a single tool, while remaining compatible with other processing and characterization techniques. As an example, we demonstrate silicon nanowires fabrication using OIR as a protective mask for plasma etch, transferring the line features into the underlying silicon substrate.
| Period | 18 Sept 2017 → 22 Sept 2017 |
|---|---|
| Event title | 43rd International conference on Micro and Nano Engineering |
| Event type | Conference |
| Conference number | 43 |
| Location | Braga, PortugalShow on map |
| Degree of Recognition | International |